ASML Reveals EUV Lithography Roadmap to 11 Nanometers and Beyond - Nanowerk

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ASML Reveals EUV Lithography Roadmap to 11 Nanometers and Beyond

Tuesday, September 30, 2008 --- 99 days ago

http://www.nanowerk.com/news/newsid=7489.php

ASML Holding NV (ASML) presents today at the 2008 International Symposium on Extreme Ultraviolet Lithography (EUV) on recent achievements in its EUV lithography program and unveils a production system roadmap that supports cost-effective chip manufacturing to at least 11 nanometers (nm). ...

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